ANFF-Q is proud to present this technical seminar from Plasma-Therm’s Process Engineering Manager, Marco Notarianni. Atomic Layer Deposition (ALD) has had significant impact both on mainstream and nanotechnology applications with the capability of depositing a wide range of materials at atomic scale, i.e. atomic layer by atomic layer. As might be expected, the successes of ALD have … Read more “Bridging ALD and PECVD for higher deposition rates and conformality”
Bridging ALD and PECVD for higher deposition rates and conformality




