ANFF-Q is currently improving processes and introducing new technologies in the ANFF-Q cleanroom located within the AIBN. These will include:

• advanced direct write lithography,
• a new auto-dispense spin coating system,
• two new fumehoods for safer and new etching processes, including HF vapour etching and providing essential exhaust to a new XeF2 etcher.

This presentation provides more details on these improvements and the planned timeline: