Custom research consumables
ANFF-Q provides a range of custom high-quality research consumables. ANFF-Q also provides 3D printing services and software to design and create highly-specialised items. Prices for popular items are listed below.
If you have something more unique in mind please contact us to discuss your requirements.
ANFF-Q houses a Heidelberg uPG101 system that is used to fabricate photolithography masks. The system has two modes:
- Mode 1 – resolves down to 2 µm (isolated lines) with a write area of 85 mm x 85 mm.
- Mode 2 – resolves down to 5 µm with a write area of 125 mm x 150 mm (design tolerance is 10%).
Chrome mask price list
|Category||Mask Size||Resolution||Price (AUD)|
|ANFF-Q membership rate||5 ”||5 µm||$200.00|
|7 ”||5 µm||$330.00|
|Non-membership rate||5 ”||5 µm||$280.00|
|7 ”||5 µm||$410.00|
Note: All mask blanks are sodalime. If you wish to order a chrome mask based on a different mask blank (e.g. quartz), please email firstname.lastname@example.org to discuss your order as longer production times may apply.
Silicon carbide on silicon wafers
The superior properties of silicon carbide (SiC) can create better products for MEMS, photonics and thin membranes, and SiC coatings could even provide a route to graphene on silicon (Si). Additionally, SiC’s epitaxial growth compatibility with aluminium nitride and galium nitride enhances the range of devices that can be developed with SiC. However, to manufacture these products at a low cost and make them commercially viable will require the utilisation of mature silicon wafer technology.
The Griffith Site of ANFF-Q, in conjunction with SPT Microtechnologies, has developed a production reactor for the epitaxial growth of 3C SiC on Si wafers, providing the route for the use of SiC on Si in mass production and bridging the gap between mature silicon wafer technology and emerging innovative SiC applications.
In collaboration with our industry partners, we would like to promote the use and development of SiC technology. If you are interested in obtaining 3C SiC on Si wafers from 2 ” to 300 mm, or would like to discuss collaborative projects or device fabrication please contact the ANFF-Q Facility Manager.
Silicon carbide windows
ANFF-Q has a range of silicon carbide films that can be used for e-beam and x-ray windows.
Our silicon carbide membranes come in 400 μm thick silicon square-sided frames. Frames are available in 5 mm, 10 mm and 20 mm sizes, with membrane window size range of 0.3 mm – 5 mm. Our potential range of SiC membrane thickness is 50 nm – 500 nm. All SiC thicknesses have less than 1nm rms roughness.
ANFF-Q can also provide custom made windows to suit your needs. Simply contact us to discuss your design and we’ll provide a detailed quote.
To place your order or discuss your custom design, please contact the ANFF-Q Facility Manager.
Silicon nitride windows
ANFF-Q provides square silicon nitride windows for synchrotron applications at a flat rate of AUD$15 per window.
Select your window parameters from the following options, or email us to request a custom design.
|Frame Thickness||Frame Size||Window Size||Film Thickness|
|675 µm||5 mm x 5 mm||500 µm||50 nm|
|1000 µm||100 nm|
|10 mm x 10 mm||2500 µm||250 nm|
|4000 µm||750 nm|
Custom windows are available at the standard rate; simply email us your specifications. Due to process development time, there may be a longer production time for custom windows.